The Effect of ITO Buffer Layer on Physical Properties of AZO Thin Films Deoisited on Glass And Pet Substrates
Abstract
Transparent conductive oxide (TCO) thin films such as Al doped zinc oxide (AZO) and tin doped indium oxide (ITO), due to their low resistivity and high transmittance, have been widely used as transparent conductive electrodes for various displays (Li et al., 2010; Minami, 2005) and photovoltaic devices (Manavizadeh et al., 2009; Bagherzadeh et al., 2009). In generally, TCO thin films were prepared by many methods such as spray pyrolysis (Lokhande & Uplane, 2000), pulsed laser deposition (Shin et al., 2011; Viespe et al., 2007), chemical vapor deposition (Gaskell & Sheel, 2011; Kim et al., 2010), sol–gel (D. Raoufi &T. Raoufi, 2009; Valencia et al., 2008) and sputtering method (Lei et al., 2010; Manavizadeh et al., 2009). Among these techniques, sputtering of TCOs is an interesting technique for all applications where low process temperatures are desired and the stoichiometry of the films are more controllable than other techniques (Manavizadeh and et. al., 2009).